Advanced 2D Optical Lithography Simulator

exposure, photoresist bake, development and reflow. Optolith provides a fast and accurate alternative to experimental evaluation of mask printability and process control. Optolith simulates both projection imaging and proximity printing with large mask-to-resist gap. Optolith is fully interfaced to all commercial IC layout tools conforming to GDSII and CIF formats, as well as to a special proprietary format used by MaskViews. As part of the Athena process simulation framework, Optolith provides seamless integration with diffusion, oxidation, implantation, etching and deposition simulation capabilities. This simulation environment allows the analysis of complex lithography effects in multilayer non-planar structures generated by oxidation, deposition and etching. It also provides unique opportunity to investigate and optimize implantation and etching process steps with real photoresist mask shapes taken into account.